Optical Fiber Polishing Liquid

- Dec 02, 2020-

Optical fiber polishing liquid is a high-purity low-metal ion polishing product produced by a special process with high-purity silicon powder as raw material. Widely used for nano-level high planarization polishing of various materials. Such as: polishing of silicon wafers, compound crystals, precision optics, gems, etc.

Ingredients
SiO2, Na2O, heavy metal impurities
Scope of application
Nano-level high planarization polishing of various materials
Features
High polishing rate, high purity, etc.

According to different polishing requirements, it can be divided into products with different particle sizes (10~150 nm). According to the difference of pH value, it can be divided into acid polishing liquid and alkaline polishing liquid.

Features
n High polishing rate, using large-size colloidal silica particles to achieve high-speed polishing (150 nm can be produced)

n Controllable particle size, according to different needs, products with different particle sizes (10-150 nm) can be produced

n High purity (Cu content less than 50 ppb), effectively reducing contamination of electronic products

High flatness processing, this product uses SiO2 colloidal particles for polishing, which will not cause physical damage to the processed parts, and achieve high flatness processing

product composition

IngredientsContent (w%)
SiO215~30
Na2O≤0.3
Heavy metal impurities≤50 ppb

Application field
1. In the field of optical communication, with the polishing products specially developed by the company for optical fiber connectors, it can achieve ultra-fine polishing effect. After polishing, the connector end face has no scratches and defects, and the 3D index and reflection attenuation index reach international standards.

2. For the polishing of hard disk substrates, the SiO2 abrasive is spherical and has the advantages of uniform particle size, good dispersion, and high planarization efficiency.

3. Rough polishing and fine polishing of silicon wafers, sapphire and other semiconductor and substrate materials, with high polishing rate, easy to clean after polishing, low surface roughness, and can obtain a quality surface with very small total thickness deviation (TTV).

4. For applications in other fields, such as stainless steel, optical glass, etc., a good polishing effect can be achieved after polishing

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